COMPARATIVE STUDY OF NANOCRYSTALLINE DIAMOND GROWTH USING PECVD AND HFCVD TECHNIQUES
Keywords:
Hot filament chemical vapor deposition; Plasma enhanced chemical vapor deposition; Etching gas; NCDAbstract
Diamond coating is one of the hot research topic due to its various industrial applications; for the diamond growth, several techniques, such as PECVD and HFCVD, have been reported. In this paper, we investigate the effects of different CVD techniques on synthesis of diamond crystals, grown on silicon and aluminum substrates, at temperature of 550˚ C and the reaction pressure of 30 Torr, in which CH4 and H2 act as a source and diluting gases, respectively. The hydrogen was used as the etching gas to enhance the diamond nucleation. As a result, we obtained a high distribution of nanodiamond with (111) crystallite structure on gold-coated silicon in HFCVD system. The samples were analyzed using AFM, SEM and XRD.
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