COMPARATIVE STUDY OF NANOCRYSTALLINE DIAMOND GROWTH USING PECVD AND HFCVD TECHNIQUES

Authors

  • Zahra KHALAJ Department of Physics, Islamic Azad University, Shahr-e-Qods Branch, Tehran, Iran. Email: khalaj.z@gmail.com.

Keywords:

Hot filament chemical vapor deposition; Plasma enhanced chemical vapor deposition; Etching gas; NCD

Abstract

Diamond coating is one of the hot research topic due to its various industrial applications; for the diamond growth, several techniques, such as PECVD and HFCVD, have been reported. In this paper, we investigate the effects of different CVD techniques on synthesis of diamond crystals, grown on silicon and aluminum substrates, at temperature of 550˚ C and the reaction pressure of 30 Torr, in which CH4 and H2 act as a source and diluting gases, respectively. The hydrogen was used as the etching gas to enhance the diamond nucleation. As a result, we obtained a high distribution of nanodiamond with (111) crystallite structure on gold-coated silicon in HFCVD system. The samples were analyzed using AFM, SEM and XRD.

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Published

2016-03-30

How to Cite

KHALAJ, Z. . (2016). COMPARATIVE STUDY OF NANOCRYSTALLINE DIAMOND GROWTH USING PECVD AND HFCVD TECHNIQUES. Studia Universitatis Babeș-Bolyai Chemia, 61(1), 235–242. Retrieved from https://studia.reviste.ubbcluj.ro/index.php/chemia/article/view/8296

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